Oct 02, 2022  
Catalog/Bulletin 2022-2023 
    
Catalog/Bulletin 2022-2023

Attendance


 

The School of Dentistry has a standard policy for attendance in all didactic and pre-clinical courses for the Programs in Dentistry, Dental Hygiene and Dental Laboratory Technology and a specific policy for attendance in the laboratory courses for the Program in Dental Laboratory Technology. These policies are included in the LSUSD Student Handbook of Policies and Procedures.

Didactic and Pre-clinical Courses

Students are required to attend all scheduled appointments/sessions in each course. Students not present when attendance is taken will be considered absent. Absence in excess of 20% of the total clock hours in any course will result in a final grade reduction of one letter grade for that course. Each department will determine general policy for monitoring attendance in assigned course(s).

There are no excused absences with this policy. The only exception is an APPROVED ABSENCE as determined by the Office of Academic Affairs.

Clinical Courses (Program in Dentistry)

Dental students are required to attend all scheduled clinic sessions as a requirement of each specific clinical course. There are no excused absences. The only exception is an APPROVED ABSENCE as determined by the Office of Academic Affairs.

Clinical Courses (Program in Dental Hygiene)

Dental hygiene students are required to attend all scheduled clinic sessions as a requirement of each specific clinical course. There are no excused absences. The only exception is an APPROVED ABSENCE as determined by the Office of Academic Affairs.

Laboratory Courses (Program in Dental Laboratory Technology)

Dental laboratory Technology students are required to attend 90% of all scheduled laboratory sessions.  There are no excused absences. The only exception is an APPROVED ABSENCE as determined by the Office of Academic Affairs.  Students who exceed the 10% missed-session limit shall have their final laboratory grade reduced according to the respective course outline.